Brent Chambers is a highly experienced process and equipment engineering manager. He has 25 years leading engineering organizations in semiconductor development, technology transfer, and ramp of high volume manufacturing processes. Chambers directed research and development of dielectric etch processes in more than 8 technologies at Intel’s California development organization. He subsequently led technology transfers in Lithography and Dry Etch technology from first silicon to high volume in 7 technologies within Intel’s Arizona fabs. For each of these semiconductor nodes he led large Lithography and Dry Etch Manufacturing organizations to achieve world class metrics for yield and output to deliver over $500M/week revenue.
Chambers holds two advanced degrees from the Massachusetts Institute of Technology, a masters in metallurgy and doctorate in Materials Science.